Effect of Halogen Doping on Optical Properties for ZnO Thin Film Prepared by Thermal Oxidation

Abdullah, Wael

doi:10.18052/www.scipress.com/ILCPA.61.149

ILCPA > Volume 61 > Effect of Halogen Doping on Optical Properties for...

< Back to Volume

Effect of Halogen Doping on Optical Properties for ZnO Thin Film Prepared by Thermal Oxidation

Full Text PDF

Abstract:

Undoped and halogen-doped zinc oxide thin films are prepared by the thermal oxidation process. Zinc acetate dihydrate, ethanol, and Diethanolamine are used as precursor, solvent, and stabilizer, respectively. In the case of ZnO:Hal. dopant Ammonium chloride NH₄Cl 99%, Benzene Bromide C₆H₅Br, or Benzene Iodide C₆H₅I for making dopant ZnO thin film with Cl, Br, I respectively is added to the precursor solution with an atomic percentage equal to 2-10.% hal. The transparent solution sprayed onto glass substrates, and are transformed into ZnO upon annealing at 500°C. XRD spectra of ZnO thin films, and optical properties of them as a function of halogen content have been investigated using U.V spectroscopy ( transmittance , refractive index, extinction coefficient and energy band gap ) for undoped and halogen-doped zinc oxide thin films.

Info:

Periodical:

International Letters of Chemistry, Physics and Astronomy (Volume 61)

Pages:

149-161

DOI:

https://doi.org/10.18052/www.scipress.com/ILCPA.61.149

Citation:

W. Abdullah, "Effect of Halogen Doping on Optical Properties for ZnO Thin Film Prepared by Thermal Oxidation", International Letters of Chemistry, Physics and Astronomy, Vol. 61, pp. 149-161, 2015

Online since:

November 2015

Authors:

Wael Abdullah

Keywords:

Halogens (Cl,Br,I), Optical Properties, Thermal Oxidation, Thin Film, ZnO

Export:

RIS, BibTeX, Text

Distribution:

Open Access

This work is licensed under a
Creative Commons Attribution 4.0 International License

References:

[1] A. Talbi, F. Sarry, M. Elhakiki, L. Le Brizoual, O. Elmazria, P. Nicolay, P. Alnot, Sensors and Actuators A 128, 78 (2006).

DOI: https://doi.org/10.1016/j.sna.2006.01.008

[2] J. J. Chen, F. Zeng, D.M. Li, J.B. Niu, F. Pan, Thin Solid Films 485, 257 (2005).

[3] J. -B. Lee, D. -H. Cho, D. -Y. Kim, C. -K. Park, J. -S. Park, Thin Solid Films 516, 475 (2007).

[4] A. N. Banerjee, C.K. Ghosh, K.K. Chattopadhyay, H. Minoura, A.K. Sarkar, A. Akiba, A. Kamiya, T. Endo, Thin Solid Films 496, 112 (2006).

DOI: https://doi.org/10.1016/j.tsf.2005.08.258

[5] J. Yoo, J. Lee, S. Kim, K. Yoon, I.J. Park, S.K. Dhungel, B. Karunagaran, D. Mangalaraj, J. Yi, Thin Solid Films 480, 213 (2005).

DOI: https://doi.org/10.1016/j.tsf.2004.11.010

[6] Tseng, Y.K.; Gao, G.J.; Chien, S.C. Thin Solid Films 2010, 518, 6259–6263.

[7] Özgür, Ü.; Alivov Ya, I.; Liu, C.; Teke, A.; Reshchikov, M.A.; Doğan, S.; Avrutin, V.; Cho, S.J.; Morkoç, H. J. Appl. Phys. 2005, 98, 041301: 1–041301: 103.

DOI: https://doi.org/10.1063/1.1992666

[8] Ellmer, K.; Klein, A.; Springer Series in Materials Science; Berlin Heidelberg, Germany, 2008; Volume 104, p.1–33.

[9] Bundesmann, C.; Schmidt-Grund, R.; Schubert, M. Springer-Verlag: Berlin Heidelberg, Germany, 2008; Volume 104, p.79–124.

[10] Chen, J.L.; Chen, D.; Chen, Z.H. Sci. China Ser. E Tech. Sci. 2009, 52, 88–94.

[11] Von Wenckstern, H.; Schmidt, H.; Brandt, M.; Lajn, A.; Pickenhain, R.; Lorenz, M.; Grundmann, M.; Hofmann, D.M.; Polity, A.; Meyer, B.K. Solid State Chem. 2009, 37, 153–172.

DOI: https://doi.org/10.1016/j.progsolidstchem.2009.11.008

[12] Khan, F.; Singh, V.S.N.; Husain, M.; Singh, P.K. Sol. Energy. Mater. Sol. Cells 2012, 100, 57–60.

[13] Mueller, J.; Mahnke, M.; Schoer, G.; Wiechmann, S. AIP Conf. Proc. 2004, 709, 268–289.

[14] M. Caglar, Y. Caglar, S. Ilican, J. Optoelectron Adv. Mater. 8, 1410 (2006).

[15] F. Yakuphanoglu, Y. Caglar, S. Ilican, M. Caglar, Physica B 394, 86 (2007).

[16] Young Yi Kim, Si Woo Kang, Bo Hyun Kong, Hyung Koun Cho, Physica B 401–402, 408 (2007).

DOI: https://doi.org/10.1016/j.physb.2007.08.199

[17] L. H. Van, M.H. Hong and J. Ding, Journal of Alloys and Compounds, 449, 207 (2008).

[18] Mujdat Caglar, Saliha Ilican, Yasemin Caglar, Fahrethin Yalkuphanogh, J Mater Sci: Mater Electro, 19, 704-708 (2008).

DOI: https://doi.org/10.1007/s10854-007-9386-2

[19] Abdullah W, International Letters of Chemistry, Physics and Astronomy Vol. 56 (2015) pp.175-183.

[20] Alhamed M. , Abdullah W. Journal of Electron Devices, Vol. 18, 2013, pp.1563-1567.

[21] Alhamed M. , Abdullah W. Journal of Electron Devices, Vol. 7, 2010, pp.246-252.

[22] Abdullah W, pH. D thesis, Aleppo University (2006).

Show More Hide

Cited By:

This article has no citations.