This work is licensed under a
Creative Commons Attribution 4.0 International License
[1] Douglas B. Chrisey and Graham K. Hubler, Pulsed Laser Deposition of Thin Flms, Wiley Interscience, New York, 199 (1994).
[2] Dijkamp, D., R. Venkatesan, X.D. Wu, S.A. Shaheen, N. Jisrawi, Y.H. Min-Lee, W.L. Mc-, and M. Croft, Preparation of Y-Ba-Cu oxide superconductor thin films using pulsed laser evaporation from high Tc bulk material, Appl. Phys. Lett. 51 (8), 619-621 (1987).
DOI: https://doi.org/10.1063/1.98366[3] Chrisey, D.B., J.S. Horwitz, J.M. Pond, R.C.Y. Auyeung, P.C. Dorsey, S.B. Qadri, L.A. Knauss, C.H. Mueller, and R.M. Yandrofski, Active microwave device applications of ferroelectric thin films, SPIE Vol. 2403, 164-174 (1995).
DOI: https://doi.org/10.1117/12.206253[4] Chrisey, D.B., P.C. Dorsey, J.S. Horwitz, L.A. Knauss, and R.C.Y. Auyeung, Pulsed laser deposition of thick films of electronic cerarnics, SPIE Vol. 2703, 386-397 (1996).
[5] Jin, S., T.H. Tiefel, M. McCormack, R.A. Fastnacht, R. Ramesh, and L.H. Chen, Thousandfold change in resistivity in magnetoresistive La-Ca-Mn-O films, Science Vol. 264, 413-415 (1994).
DOI: https://doi.org/10.1126/science.264.5157.413[6] Horwitz, J.S., P.C. Dorsey, N.C. Koon, M. Rubinstein, J.M. Byers, D.J. Gillespie, M.S. Osofsky, V.G. Harris, K.S. Grabowski, D.L. hies, E.P. Donovan, R.E. Treece, and D.B. Chrisey, The effect of oxygen deposition pressure and temperature on the structure and properties of pulsed laser deposited La0. 67Ca0. 33MnOδ films, SOPI, E Vol. 2703, 526-533 (1996).
DOI: https://doi.org/10.1557/proc-401-525[7] Antoni, F., C. Fuchs, and E. Fogarassy, Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monatomic target: application to Silicon and germanium, Appl. Surf. Sci. 96-98, 50-54 (1996).
DOI: https://doi.org/10.1016/b978-0-444-82412-7.50013-4[8] Cillessen, J.F.M., R.M. Wolf, J.B. Giesbers, P.W.M. Blom, K. -O. Grosse-Holz, and E. Pastoor, Growth, structuring and characterisation of all-oxide thin film devices prepared by pulsed laser deposition, Appl. Surf. Sci. 96~98, 744-751 (1996).
DOI: https://doi.org/10.1016/b978-0-444-82412-7.50136-x[9] Chergui, A., J.L. Deiss, J.B. Grun, J.L. Loison, M. Robino, and R. Beseman, Structural and optical characteristics of pulsed laser deposited ZnSe epilayers, Appl. Surf. Sci. 96998, 874-880 (1996).
DOI: https://doi.org/10.1016/b978-0-444-82412-7.50160-7[10] Xiao, R.F., H.B. Liao, N. Cue, X.W. Sun, and H.S. Kwok, Growth of c-axis oriented gallium nitride thin films on an amorphous substrate by the liquid-target pulsed laser deposition technique, J. Appl. Phys. 80 (7), 4226-4228 (1996).
DOI: https://doi.org/10.1063/1.363302[11] Narayan, J., H. Wu, and R.D. Vispute, Laser processing of BN and AIN films, J. of EIec. Mat. 25 (l), 143-149 (1996).
[12] Feiler, D., R.S. Williams, A.A. Talin, H. Yoon, and M.S. Goorsky, Pulsed laser deposition of epitaxial AlN, GaN, and InN thin films on sapphire(0001), J. of Crystal Growth 171, 12-20 (1997).
DOI: https://doi.org/10.1016/s0022-0248(96)00284-9[13] Craciun, V., S. Amirhaghi, D. Craciun, J. Eldars, J.G.E. Gardeniers, and I.W. Boyd, Effects of laser wavelength and fluence on the growth of Zn0 thin films by pulsed laser deposition, Appl. Surf. Sci. 86, 99-106 (1995).
DOI: https://doi.org/10.1016/0169-4332(94)00405-6[14] Durand, H. -A., J. -H. B rimaud, O. Hellman, H. Shibata, S. Sakuragi, Y. Makita, D. Gesbert, and P. Meyrueis, Excimer laser sputtering deposition of TiO2 optical coating for solar cells, Appl. Surf. Sci. 86, 122- 127 (1995).
DOI: https://doi.org/10.1016/0169-4332(94)00407-2[15] Afonso, C.N., J.M. Ballesteros, J. Gonzalo, G.C. Righini, and S. Pelli, Rare-earth doped glass waveguides prepared by pulsed laser deposition, Appl. Surf. Sci. 96-98, 760-763 (1996).
DOI: https://doi.org/10.1016/b978-0-444-82412-7.50138-3[16] Reisse, G., S. Weissmantel, B. Keisser, and B. Steiger, Deposition of optical coatings by pulsed laser ablation, SPIE Vol. 2403, 212-222 (1995).
DOI: https://doi.org/10.1117/12.206252[17] Friedmann, T.A., D.R. Tallant, J.C. Barbour, J.P. Sullivan, M.P. Siegal, R.L. Simpson, J. Mikkalson, and K.F. McCarty, Characterization of carbon nitride films produced by pulsed laser deposition, Mat. Res. Soc. Symp. Proc. Vol. 388, 393-398 (1995).
DOI: https://doi.org/10.1557/proc-388-393[18] Zhang, Z.J., S. Fan, J. Huang, and C.M. Lieber, Pulsed laser deposition and physical properties of carbon nitride thin films, J. of Elec. Mat. 25 (l), 57-61 (1996).
DOI: https://doi.org/10.1007/bf02666174[19] Puretzky, A.A., D.B. Geohegan, GE. Jellison Jr., and M.M. McGibbon, Amorphous diamond-like carbon film growth by KrF- and ArF- excimer laser PLD: correlation with plume properties, Mat. Res. Soc. Symp. Proc. Vol. 388, 145-150 (1995).
DOI: https://doi.org/10.1557/proc-388-145[20] Lowndes, D.H., D.B. Geohegan, A.A. Puretzky, D.P. Norton, C.M. Rouleau, Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition, Science Vol. 273, 898-903 (1996).
DOI: https://doi.org/10.1126/science.273.5277.898[21] B. D. Jackson, Pulsed-Laser Deposition of Silicon Dioxiode Thin-Films Using the Molecular Flourine Laser, M. Sc. thesis, University of Toronto, Canada, (1997).
[22] Fair, R.B., Conventional and rapid thermal processes, in US1 Technology, edited by C.Y. Chang and S.M. Sze, McGraw-Hill Companies, Iric., New York, 144-204 (1996).
[23] Fogarassy, E., A. Slaoui, C. Fuchs, and J.P. Stoquert, Synthesis of Si02 thin films by reactive excimer laser ablation, Appl. Surf. Sci. 54, 180- 186 (1992).
DOI: https://doi.org/10.1016/0169-4332(92)90041-u[24] Slaoui, A., E. Fogarassy, C. Fuchs, and P. Siffert, Characterization of SiO2 films deposited by reactive excimer laser ablation of Si0 target", paper presented at INFOS , 91, Liverpool, April 199 1, Contributed Papers, Section 3, 195- 198 (1991).
[25] Slaoui, A., E. Fogarassy, C. Fuchs, and P. Siffert, Properties of silicon dioxide films prepared by pulsed-laser ablation, J. Appl. Phys. 71 (2), 590-596 (1992).
DOI: https://doi.org/10.1063/1.350411[26] Wolf, P.J., The plasma properties of laser-ablated SiOs, J. Appl. Phys. 72 (4), 1280-1289 (1992).
[27] Baeri, P., R. Reitano, and N. Marino, SiO2 film deposition by XeCl laser ablation of fused silica, App. Surf. Sci. 86, 128-133, (1995).
DOI: https://doi.org/10.1016/0169-4332(94)00379-3