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International Letters of Chemistry, Physics and Astronomy
Volume 56


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Effect of Annealing Temperature on the Optical Properties of TiO2 Thin Films Prepared by Pulse Laser Deposition

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TiO2 thin films were prepared by pulse laser deposition technique on glass substrates with laser power 700 mJ and 900 shot at distance 1cm under vacuum of 10-2 mbar with different annealing temperature (273, 373, 423)K. The influences of the annealing temperature on the optical properties of TiO2 thin films were mainly investigated. TiO2 is a wide band gap n-type semi-conductor that has a wide range of applications. It was found that the optical properties of TiO2 thin films were dependent on the annealing temperature. The values of optical energy gap decreases from (3.4 to 3.2) eV when increasing annealing temperature. The optical constants such as refractive index, extinction coefficient, real and imaginary dielectric constants as a function of wavelength were determined.


International Letters of Chemistry, Physics and Astronomy (Volume 56)
K. A. Aadim et al., "Effect of Annealing Temperature on the Optical Properties of TiO2 Thin Films Prepared by Pulse Laser Deposition", International Letters of Chemistry, Physics and Astronomy, Vol. 56, pp. 63-70, 2015
Online since:
Jul 2015

[1] R. C. Weast and S. M. Selby, Hand Book chemistry & physics, (CRC), 3rd edition, p.1245 (1967).

[2] P. A. Cox. Transition Metal Oxides And Introduction to their electronic structure and properties, Clarendon Press, Oxford, p.456 (1995).

[3] M. Walczak, E. L. Papadopoulou, M. Sanz, A. Manousaki, J. F. Marco and M. Castillejo, Structural and morphological characterization of TiO2 nanostructured films grown by nanosecond pulsed laser deposition, Applied Surface Science. 31, p.250 (2010).

DOI: 10.1016/j.apsusc.2008.07.098

[4] N. Okubo, T. Nakazawa, Y. Katano, and I. Yoshizawa, Fabrication of nanoparticles of anatase TiO2 by oxygen-supplied pulsed laser deposition, Applied Surface Science, 198, p.683 (2002).

DOI: 10.1016/s0169-4332(02)00441-5

[5] H. Lina, Abdul K. Rumaizb, Meghan Schulzc, DeminWanga, Reza Rockd, C.P. Huanga, and S. Ismat Shah, Photocatalytic activity of pulsed laser deposited TiO2 thin films, Materials Science and Engineering B 151 p.133 (2008).

DOI: 10.1016/j.mseb.2008.05.016

[6] M. O. Abou-Helal, and W. T Seeber, Preparation of TiO2 thin films by spray pyrolysis to be used as a photocatalyst, Applied Surface cience. 195, p.62 (2002).

DOI: 10.1016/s0169-4332(02)00533-0

[7] M. Habibi, N. Talebian and J. Choi, The Effect of Annealing on Photocatalytic Properties of Nanostructured Titanium Dioxide Thin Films, Dyes and Pigments, 73, pp.103-110 (2007).

DOI: 10.1016/j.dyepig.2005.10.016

[8] C. Yang, H. Fan, Y. Xi, J. Chen and Z. Li, Effects of Depositing Temperatures on Structure and Optical Properties of TiO2 Film Deposited by Ion Beam Assisted Electron Beam Evaporation, Applied Surface Science, 254, pp.2685-2689 (2008).

DOI: 10.1016/j.apsusc.2007.10.006

[9] C. Tavares, J. Vieira, L. Rebouta, G. Hungerford, P. Coutinho, V. Teixeira, J. Carneiro and A. Fernandes, Reactive Sputtering Deposition of Photocatalytic TiO2Thin Films on Glass Substrates, Mater. Sci. Eng., 138, pp.139-143 (2007).

DOI: 10.1016/j.mseb.2005.11.043

[10] A. Akl, H. Kamal and K. Abdel-Hady, Fabrication and Characterization of Sputtered Titanium Dioxide Films, Applied Surface Science, 252, p.8651 (2006).

DOI: 10.1016/j.apsusc.2005.12.001

[11] M. Ghamsari and A. Bahramian, High Transparent Sol–Gel Derived Nanostructured TiO2 Thin Film, Materials Letters, 62, pp.361-364 (2008).

DOI: 10.1016/j.matlet.2007.05.053

[12] Z. Wang, U. Helmersson and P. Käll, Optical Properties of Anatase TiO2Thin Films Prepared by Aqueous Sol–Gel Process at Low Temperature, Thin Solid Films, 405, pp.50-54 (2002).

DOI: 10.1016/s0040-6090(01)01767-9

[13] H. Sun, C. Wang, S. Pang, X. Li, Y. Tao, H. Tang and M. Liu, Photocatalytic TiO2 Films Prepared by Chemical Vapor Deposition at Atmosphere Pressure, Journal of Non-Crystalline Solids, 354, pp.1440-1443 (2008).

DOI: 10.1016/j.jnoncrysol.2007.01.108

[14] W. Yang and C. Wolden, Plasma-Enhanced Chemical Vapor Deposition of TiO2Thin Films for Dielectric Applications, Thin Solid Films, 515, pp.1708-1713 (2006).

DOI: 10.1016/j.tsf.2006.06.010

[15] Y. Ming-Che, Strategies to Improve the Electrochemical Performance of Electrodes for Li-Ion Batteries, Ph. D Thesis, University of Florida, (2012).

[16] M. Hassan, A. Haseeb, R. Saidur and H. Masjuki, Effects of Annealing Treatment on Optical Properties of Anatase TiO2 Thin Films, World Academy of Science, Engineering and Technology, 40, pp.221-225 (2008).

[17] S. Karvinen, The Effect of Trace Element Doping of TiO2 on the Crystal Growth and on the Anatase to rutile Phase Transformation of TiO2, Solid State Sciences, 5, pp.811-819 (2003).

DOI: 10.1016/s1293-2558(03)00082-7

[18] S. Sankar and K. Gopchandran, Effect of Annealing on the Structural, Electrical and Optical Properties of Nnanostructured TiO2 Thin Films, Crystal Research Technology, 44, pp.989-994 (2009).

DOI: 10.1002/crat.200900073

[19] T. Fukano, T. Motohiro, T. Ida, H. Hashizume, J. Appl. Phys. 97 (2005) 084314.

[20] W. Brütting, M. Meier, M. Herold, S. Krag, M. Schwoerer, Chem. Phys. 227 (1998) 243.

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