Paper Titles in Periodical
International Letters of Chemistry, Physics and Astronomy
Volume 48

Subscribe

Subscribe to our Newsletter and get informed about new publication regulary and special discounts for subscribers!

ILCPA > Volume 48 > Effects of Cu-Doping on Optical Properties of NiO
Effects of Cu-Doping on Optical Properties of NiO
< Back to Volume

Effects of Cu-Doping on Optical Properties of NiO

Full Text PDF

Abstract:

This work presents the effect of Cu-doping on some optical properties of Cu:NiO thin film prepared by spray pyrolysis technique. UV-Visible spectrophotometer in the range 380-900 nm used to determine the absorbance spectra for various Cu-doping of Cu:NiO thin film. The transmittance and energy gap are decreased with increasing Cu-doping in the prepared films, while absorption coefficient, extinction coefficient, and skin depth are increased with increasing Cu-doping.

Info:

Periodical:
International Letters of Chemistry, Physics and Astronomy (Volume 48)
Pages:
155-162
DOI:
https://doi.org/10.18052/www.scipress.com/ILCPA.48.155
Citation:
N. N. Jandow "Effects of Cu-Doping on Optical Properties of NiO", International Letters of Chemistry, Physics and Astronomy, Vol. 48, pp. 155-162, 2015
Online since:
March 2015
Authors:
Nidhal Nissan Jandow
Keywords:
Chemical Spray Pyrolysis, Energy Gap, NiO Thin Films, Optical Properties
Export:
RIS, BibTeX, Text
Distribution:
Open Access

Creative Commons License
This work is licensed under a
Creative Commons Attribution 4.0 International License

References:

W. L. Roth, Phys. Rev. 110 (1958) 1333.

A. Kuzmin, J. Purans, and A. Rodionov, J. Phys: Condens. Mater. 9(1997)6979.

E. Fujii, A. Tomozawa, H. Torii, R. Takayama, Jpn. J. Appl. Phys. 35(1996)L328.

H. Sato, T. Minami, S. Takata, T. Yamada, Thin Solid Films 236(1993)27.

K. Youshmura, T. Miki, S. Tanemura, Jpn. J. Appl. Phys. 34(1995)2440.

H. Kumagai, M. Matsumoto, K. Toyoda, M. Obara, J. Mater. Sci. Lett. 15(1996)1081.

Y. R. Park, K.J. Kim, Solgel preparation and optical characterization of NiO and Ni1−xZnxOthinfilms, Journal of CrystalGrowth258 (2003) 380-384.

B. A. Reguig, A. Khelil, L. Cattin, M. Morsli and J.C. Bernede, Properties of NiO thin films deposited by intermittent spraypyrolysis process, Applied Surface Science253 (2007) 4330-4334.

W. C. Yeh and M. Matsumura, Chemical vapor deposition ofnickel oxide films from bis-π-cyclopentadienyl-nickel, Jpn. J. Appl. Phys. 36(1997) 6884-6887.

U. S. Joshi, R. Takahashi, Y. Matsumoto, H. Koinuma, Structure of NiO and Li-doped NiO single crystalline thin layerswith atomically flat surface, Thin Solid Films 486 (2005) 214-217.

Y. Kakehi S. Nakao, K. Satoh, T. Kusaka, Room-temperatureepitaxial growth of NiO(111) thin films by pulsed laser deposition, Journal of Crystal Growth237-239 (2002) 591-595.

H. L. Chen, Y.M. Lu, W.S. Hwang, Thickness dependence of electrical and optical properties of sputtered nickel oxide films, Thin Solid Films 498(2006) 266-270.

Ying Zhou, DonghongGu, YongyouGeng, FuxiGan, Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering, Materials Science and Engineering B135 (2006) 125-128.

Y. M. Lu, W.S. Hwang, J.S. Yang, H.C. Chuang, Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering, Thin Solid Films 420-421 (2002) 54- 61.

H. L. Chen, Y.M. Lu, W.S. Hwang, Characterization of sputtered NiO thin films, Surface and Coatings Technology 198 (2005) 138-142.

J. Tauc, Amorphous and Liquid Semiconductors, London (1974).

R. A. Grenier, Semiconductor Device, Electronic Energy Series, McGraw-Hill, Book Co. Inc. (1961).

Ludmila Ekertova, Physics of Thin Films, (1977).

J. F. Eloy, Power Lasers, National School of Physics, Grenoble, France, JohnWiley & Sons (1984) 59. ( Received 01 March 2015; accepted 18 March 2015 ).

Show More Hide