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International Letters of Chemistry, Physics and Astronomy
Volume 48

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Effect of Cu-Doping on Urbach Energy and Dispersion Parameters of Cu:NiO Film Deposited by CSP

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Abstract:

This work presents the effect of Cu-doping on Urbach energy and dispersion parameters of Cu:NiO thin film prepared by spray pyrolysis technique. UV-Visible spectrophotometer in the range 380-900 nm used to determine the absorbance spectra for various Cu-doping of Cu:NiO thin film. The absorbance and optical conductivity increased with increasing Cu-doping in the prepared films. Dispersion parameters that studied are decreased with increasing Cu-doping while Urbach energy increased.

Info:

Periodical:
International Letters of Chemistry, Physics and Astronomy (Volume 48)
Pages:
138-145
DOI:
10.18052/www.scipress.com/ILCPA.48.138
Citation:
M. O. Dawood "Effect of Cu-Doping on Urbach Energy and Dispersion Parameters of Cu:NiO Film Deposited by CSP", International Letters of Chemistry, Physics and Astronomy, Vol. 48, pp. 138-145, 2015
Online since:
Mar 2015
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References:

H. Sato, T. Minami, S. Takata, T. Yamada, Transparent conducting p-type NiO thinfilms prepared by magnetron sputtering, Thin Solid Films236 (1993) 27-31.

A. M. El-Naggar, Opt. Laser Technol. 33 (2001) 237.

X.S. Miao, T.C. Chong, Y.M. Huang, et al., Jpn. J. Appl. Phys. 38 (1999) 1638.

U.S. Joshia, R. Takahashia, Y. Matsumotoa, H. Koinuma, Thin Solid Films 486(2005) 214-217.

H. Sato, T. Minami, S. Tanaka, T. Yamada, Thin Solid Films 236 (1993) 27.

S.H. Lin, F.R. Chen, J.J. Kai, Appl. Surf. Sci. 254 (2008) 3357.

Z. Zhu, N. Wei, H. Liu, Z. He, Adv. Powder Technol., doi: 10. 1016/j. apt. (2010). 06. 008.

X. Chen, Z. Zhang, C. Shi, X. Li, Mater. Lett. 62 (2008) 346-351.

X. Ni, Q. Zhao, F. Zhou, H. Zheng, J. Cheng, B. Li, J. Cryst. Growth 289 (2006) 299- 302.

K.T. Kim, G. -H. Kim, J. -C. Woo, C. Kim, Surf. Coat. Technol. 202 (2008)5650-5653.

D. Mutschall, S.A. Berger, and E. Obermeier, Proc. of 6thinternational meeting on chemical sensors, Gaithersburg, 28(1996).

J.S. Svensson and C.G. Granqvist, Solar Energy Materials 16(1987)19.

A. E Jiménez-González, J.G. Cambray, and A.A. Gutiérrez., Surface Engineering. 16(2000)77.

A. E. Jiménez-González and J.G. Cambray, SurfaceEngineering. 16(2000)73.

W. Brückner, R. Kaltofen, J. Thomas, M. Hecker, M. Uhlemann, S. Oswald, D. Elefant, and C. M. Schneider, Journal of Applied Physics. 94(2003)4853.

L. Berkat, L. Cattin, A. Reguig, M. Regragui and J.C. BernedeMater. Chem. and Phys. 89(2005)11.

J. I. Pankove, Optical processes in semiconductors, Prentice-Hall, New York (1971).

S. A. Mahmoud, ShereenAlshomer, Mou'ad A. Tarawnh, Structural and Optical Dispersion Characterisation of Sprayed Nickel Oxide Thin Films, Journal of Modern Physics2 (2011) 1178-1186.

J. Tauc, Amorphous and Liquid Semiconductors, London (1974).

F. Moser, F. Urbach, Phys. Rev. 102 (1956) 1519.

W. Martienssen, J. Phys. Chem. Solids 2 (1957) 257.

A. K. Wolaton, T.S. Moss, Proc. Roy. Soc. 81 (1963) 5091.

S. H. Wemple, M. DiDomenico, Phys. Rev. Lett. 23 (1969) 1156. ( Received 01 March 2015; accepted 19 March 2015 ).

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