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N. Konofaos, E. K. Evangelou, Sci. Technol. 18 (2003) 56-59.
F. Rebib, E. Tomasella, M. Dubois, J. Cellier, T. Sauvage, M. Jacquet, Thin solid films 515 ( 2007) 3480-3487.
F. Rebib, E. Tomasella, V. Micheli, C. Eypert, J. Cellier, N. Laidani, Opt. Mater. 31 (2009) 510-513.
M. Bedjaoui, B. Despax, Thin solid film 815 (2010) 4142-4149.
F. Rrebib, E. Tomasella, V. Micheli, C. Eypert, J. Cellier, N. Laidani, Opt. Mater. 31 (2009) 510-513.
S. H. Mohamed, Physica B 406 (2011) 211-215.
Y. Liu, I. K. Lin, X. Zhang, Mat. Sci. Engineering A 489 (2008) 294-301.
D. V. Tsu, G. Lucovsky, M. J. Mantini, Phys. Rev. B 33 (1986) 7069-7076.
J. A. Diniz, P. J. Tatsch, M. A. A. Pudenzi, Appl. Phys. Lett. 69 (1996) 2214-2215.
T. Maruyma, T. Shirai, Appl. Phys. Lett. 63 (1993) 611-613.
V. P. Tolstoy, I. V. Chernyshova, V. A. Skryshevsky, Hand book of infrared spectroscopy of ultra thin films, A John , Wiley and Sons, Inc., (2003).
W. L. Scopel, M. C. A. Fantini, M. I. Alayo, I. Pereyra, Thin Solid Films 413 (2002) 59-64.
F. Giorgis, C. F. Pirri, E. Tresso, Thin Solid Films 307 (1997) 298-305.
R. K. Pandey, L. S. Patil, J. P. Bange, D. R. Patil, A. M. Ahajan, D. S. Patil, D. K. Gautam, Opt. Mater. 25 (2004) 1-7.
L. S. Patil, R. K. Pandey, J. P. Bange, S. A. Gaikwad, D. K. Gautam, Opt. Mater. 27 (2005) 663-670.
H. J. Schliwinski, U. Schnakenberg, W. Windbrache, H. Neff, P. Lange, J. Electrochem. Soc. 139 (1992) 1730-1735.
J. X. Zhang, H. Cheng, Y. Z. Chen, A. Uddin, Shu Yuan, S. J. Geng, S. Zhang, Surface and coating technology 198 (2005) 68-73.
D. K. Schroder, Semiconductor Material and Device Characterization, John-Wiley & Sons, Inc. (NJ, USA) (2006), Ch. 6, 328.
S. M. Sze, K. K. Ng, Physics of Semiconductor Devices, 3rd ed., John Willy Sons Inc., (2007).
E. H. Nicollian, J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, John Wiley and Sons, (2003).
M. M. Ismael, Characteristics of SiOxNy Thin Films Prepared by CO2 Laser, Msc. Thesis, Salahaddin University-Erbil, (2010).
S. M. Sze, Physics of Semiconductor Devices, second ed., Wiley/Interscience, New York, (1981). ( Received 24 August 2013; accepted 01 September 2013 ).
[1] I. Karaduman, D. Yıldız, M. Sincar, S. Acar, "UV light activated gas sensor for NO2 detection", Materials Science in Semiconductor Processing, Vol. 28, p. 43, 2014
DOI: https://doi.org/10.1016/j.mssp.2014.04.011